苏彩丽,魏绪明.CH3(ad)在清洁及预吸附氧Pd(100)表面的热脱附性能[J].分子催化,1997,(1):21-26 |
CH3(ad)在清洁及预吸附氧Pd(100)表面的热脱附性能 |
Thermal Desorption Spectrometry of CH 3 (ad) on Clean and Oxygen Preadsorbed Pd(100) |
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DOI: |
中文关键词: 吸附 脱附 热稳定性 钯 结构 氢化碳 吸附剂 |
英文关键词:CH 3I, HREELS, TDS, UPS, Thermal stability, Adsorption and desorption, CH 3 -, Pd |
基金项目: |
苏彩丽 魏绪明 |
[1]中国科学院兰州化学物理研究所 [2]中国科学院大连化学物理研究所催化基础国家重点实验室 |
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中文摘要: |
用高分辨电子能量损失谱,热脱附谱,紫外光电子能谱研究了CH3在清洁及预吸附氧Pd表面上的热稳定性。CH3由CH3I在Pd表面的热分解来产生。CH3I的HREELS表明,CH3中的C-H键近似与表面平行,CH3I在Pd表面低于110K时已裂解为CH3和I,大量的CH3在200-210K的温度范围内的H结合并以CH4的形式脱附,但在氧改性表面,CH4脱附的温度范围变宽,脱附温度有所提高,可能是由于表面 |
英文摘要: |
The thermal decomposition of CH 3I on clean and oxygen preadsorbed Pd(100) has been studied using high resolution electron energy loss spectroscopy(HREELS), ultraviolet photoelectron spectroscopy(UPS) and thermal desorption spectroscopy(TDS) at 110-500 K. The very weak C-H bond vibrational spectra of CH 3I implies that the C-H bond is almost parallel to the surface. It is observed that CH 3I decomposes to CH 3 (ad) and I(ad) below 110 K, CH 3 (ad) reacts with H(ad) and desorbs from the surface at 200-210 K. The desorption temperature of CH 3 (ad) on the oxygen preadsorbed surface is a little higher (up to 250 K) than that on clean surface. It indicates that the thermal stability of CH 3 (ad) is enhanced by the preadsorbed oxygen. Maybe, it is due to the blocking effects of preadsorbed oxygen and the reaction between O(ad) and H(ad). |
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